I’d like to know the basics of PVD; do you have any literature that explains the theory?
I understand that aluminium can be vaporized and adhere to a substrate, but I can’t understand how some oxides adhere to them. I imagine that the metallic element is evaporated and reacts with the oxygen, correct? How does it work?
Answer.
William Andrew Publishing has a series of books that cover many aspects of PVD. Below is a link that takes you to the one I wrote that specifically deals with deposition using roll-to-roll coating systems. This does have information about the different types of vacuum sources and reactive deposition but is aimed at web processing. If you want to deposit hard coatings onto rigid substrates there are other books in the series that would have more details of this type of hard coating (TiC, etc)
http://www.williamandrew.com/title.php?id=3
You are essentially correct that you can evaporate one material and the combine it with another to form a compound in a reactive process. Exciting the gas by using plasma to excite the gas so making it more reactive can speed up this process.
However it is also possible to deposit compounds directly by magnetron sputtering where the target material is of the final desired stoichiometry and once the target has been bedded in it will deposit the same compound directly onto the substrate. This is a slower process than the likes of evaporation but is generally stoichiometrically more precise and so the likes of transparent conducting coatings can be deposited where there is a controlled oxygen substoichiometry of a few parts per million of oxygen that creates the conductivity.
The way the materials are heated to be evaporated can vary from using resistance, induction, radiant, arc or electron beam heated evaporation sources. Additional plasma can be used to help react or densify the coating, known as ion plating, and these plasmas can be generated in a variety of ways such as ion beam, triode, microwave, cold cathode, arc, etc. All of which makes the choice and design of systems an interesting proposition and why there can be very different system designs from different manufacturers for producing the same coatings.
Finally there is also the Chemical Vapour Deposition route to depositing coatings where the starting materials are either liquids or gases and these are mixed and decomposed using either heat, light, plasma or a combination of these to deposit the desired coating and pump away the exhaust gases. This can be competitive for some processes such as some oxide barrier coatings or some of the semiconductor photovoltaic coatings but for many others the management of the chemicals can be more expensive than the higher cost of the other process types.
Below are the books that I generally list as being useful.
Added to this would be the book by R.F Bunshah of PVD for which I do not have the ISBN number to hand (sorry about that).
•Books
1. C.A.Bishop ISBN 0-8155-1535-9
Vacuum deposition onto webs, films and foils
2. Handbook of Thin Film Processes Vol 1 & 2
Eds David A. Glocker S. Ismat Shah ISBN 0 7503 0311 5
3. Semiconducting transparent thin films – H.L. Hartnagel, A.L.Dawar, A.K. Jain, C.Jagadish ISBN 0-7503 0322 0
4. Thin-film optical filters – H.A. MacLeod ISBN 0-7503 0688 2
5. Coated glass – applications & markets
Russell J. Hill & Steven J. Nadel ISBN 0-914289 01 2
6. Modern vacuum practice – N.Harris ISBN 0-07 707099 2
7. Coatings on glass H.K.Pulker ISBN 0 444 42360 5
8. Thin film processes - J.L.Vossen & W.Kern ISBN 0-12-728250 5
9. The physical properties of thin metal films
Ed. G.P. Zhigal’skii & B.K.Jones ISBN 0-415-28390-6
10. Industrial plasma engineering –Vol 1 (Principles) & 2(Applications)
J.Reece Roth ISBN 0 7503 0318 2
11. Chemical vapor deposition -
Ed Jong-Hee Park ISBN 0 87170 731 4
I hope that you find this information of use.
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