Question about pumping
Dear sir
Tell me about the vacuum coating instrument. why we one backing and roughing then hivac? whats the pressure range of each process?
and
Is the Same principle used for sputtering unit or not? why?
Basics of pumping.
Air is viscous. I you sweep your hand through the air you can feel the air against your hand. The are a lot of molecules that are colliding all the time with each other. At atmospheric pressure and down to around 10-1 mbar or 10-2 mbar if you use some kind of impeller or piston to capture a volume of gas and remove it the remaining gas will soon rearrange itself into the available space at a slightly lower pressure. This is all the roughing pumps are doing. Rotary vane pumps use an offset shaft to allow the rotating vane to capture a volume of gas and then seal it off from the vacuum vessel and compress the gas so that it exhausts to atmosphere an then this action is repeated for every revolution of the shaft.
Below 10-1 mbar or 10-2 mbar there is little gas left in the system and so the roughing pumps are losing efficiency and so another sort of pump is often added which is the Rootes pump or Rootes Blower. This has a pair of fast rotating lobed shafts and the principle is the same in that they capture a volume of gas and compress it but this time the compression is only enough that it feeds the roughing pump which then finishes of the job of capturing the gas, that is now at a higher pressure than the system, and exhausting it to air. This will take the pressure down to the 10-3 mbar or 10-4 mbar range. This region of 10-1 mbar or 10-2 mbar to 10-3 mbar or 10-4 mbar is known as the intermediate pressure range. Below 10-3 mbar or 10-4 mbar neither the Rootes nor roughing pumps will be effective and so another type of pump is required. The most commonly used pump is the diffusion pump particularly in aluminium evaporation metallizers. In sputter systems where there are other requirements Cryopumps or turbomolecular pumps are also commonly found. Below10-3 mbar or 10-4 mbar the way the gas behaves is different. There is so little gas left in the vacuum vessel that the gas atoms undergo few collisions with other gas atoms. They will often travel from one side of the vessel to the other without hitting anything else. Thus trying to capture a volume of gas and compress it will not work well. So in this case the pumps simply rely on the statistics of the gas atoms bouncing around and finally falling into the pumping orifice. Once in the pump throat the aim is to then make sure it does not return to the system. In the diffusion pump this is achieved by boiling oil and taking the oil vapour and jetting it downwards so that a gas atom that falls into the jet is hit by the oil vapour atoms and knocked down towards the bottom of the diffusion pump. Enough atoms are in this way collected at the bottom of the pump that the pressure is high enough that the roughing pump can be used to pump it away. The roughing pump used in this way is called a backing pump. For turbomolecular pumps the gas atom falls into the path of a rotating fan that has angled blades that knock the atom downwards. The lack of oil in the turbomolecular pump makes this attractive where very clean processes are essential but the pumps are not as large and the costs are greater so there has to be a justifiable need for this type of pump. Cryopumps are also an oil-free pump and this simple used compressed helium to take the temperature of a surface down to temperature of 4 Kelvin where most gases will condense and freeze. This is a collection pump and does not require a backing pump but it has a finite capacity and the ice needs to be melted and pumped away periodically. This capacity for hydrogen is limited and so for roll-to-roll coating processes where there is plenty of water vapour and a plasma that can crack the water into oxygen and hydrogen this is not a good pump as the hydrogen is one gas that does not freeze and the capacity to pump hydrogen is poor. These pumps have the capability of pumping the system down to 10-6 mbar or 10-7 mbar depending on pump and system size and backing pump performance, oils used in the pumps and system leaks.
The base pressure is often used as a measure of the pumping performance but it is also a measure of the surface area within the vessel and the leaks into the vessel. The aim in aluminium evaporation is to have a low contamination rate. Water vapour is a contaminant as it will oxidise the aluminium hence you want the metal arrival rate to be more than a couple of orders of magnitude faster than the oxygen arrival rate if you want to have a contamination rate of around 1%. However pumping for along time to achieve a low base pressure is expensive and there is a risk of oil backstreaming which will adversely affect adhesion. So the base pressure is often an easily achieved pressure at which point the aluminium deposition process can be started and acceptable product produced. This will be different for different machines and customers. Aluminium deposition also needs to have a low pressure so that the aluminium when evaporated does not collide with any gas but travels directly to the substrate where it condenses.
Sputtering is a different process in that it requires a gas pressure of around 10-3 mbar and so processing gas is introduced. This allows more flexibility in choosing the base pressure as well as slightly different controls to balance the gas introduction and pumping to maintain a steady gas pressure in the sputtering zone. As the sputtering zone is at a higher pressure there will be some gas scattering and so the sputtering targets are often placed closer to the deposition drum than evaporation sources are to reduce this. Magnets are used to help confine the electrons which make the ionising collisions to keep the plasma active. This combination of magnetic confinement but low pressure means that the material ejected from the target surface is not scattered much and so most of it will reach the substrate where it is condensed to form the coating.


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